发明名称 APPARATUS OF MANUFACTURING PLATINUM-FAMILY CATALYST COATED SUBSTRATE FOR ELECTRODES OF ELECTROCHEMICAL CELL BY PLASMA AND MANUFACTURING METHOD USING THE SAME
摘要 A system for producing a Pt-based metal thin film for an electrode catalyst by using plasma discharge is provided to allow simple and prompt production of a Pt-based metal thin film, to increase the productivity by simplifying the overall process and reducing the processing time, and to improve the efficiency in generating hydrogen or electricity. A system for producing a Pt-based metal thin film for an electrode catalyst by using plasma discharge comprises: a mixed gas injection unit for injecting a mixed gas of hydrogen with inert gas; a plasma reactor(6) including a pair of electrodes formed of a first electrode(5) having an insulator(4) surrounding the electrode surface and a substrate(3) coated with a thin film(S) of a Pt-based metal-containing compound and formed on the insulator, and a second electrode(1) having an insulator(2) surrounding the electrode and spaced apart from the thin film of the Pt-based metal-containing compound coated on the surface of the first electrode by a predetermined distance(d) so that the mixed gas passes therethrough; and a power supply unit(7) connected to the first electrode and the second electrode to cause plasma discharge.
申请公布号 KR100792152(B1) 申请公布日期 2008.01.04
申请号 KR20060065093 申请日期 2006.07.11
申请人 KOREA ATOMIC ENERGY RESEARCH INSTITUTE;KOREA HYDRO & NUCLEAR POWER CO., LTD. 发明人 LEE, WOONG MOO;KOO, IL GYO;SHIN, YOUNG JOON;LEE, KI YOUNG;CHANG, JONG HWA
分类号 H01M4/88 主分类号 H01M4/88
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