| 摘要 |
<p>A chuck for an exposure apparatus is provided to support stably a substrate by suppressing deformation of the substrate through a rib horizontally extended to a lift bar. A chuck for an exposure apparatus is formed in a plane shape surrounded by a curve. The chuck for the exposure apparatus includes stage units(111) and a lift bar(121). A plurality of stage units support a substrate by being separated from each other in a plane direction so as to form a bar receiving unit(115) therebetween. The lift bar lifts the substrate by being received inside the bar receiving unit. The bar receiving unit is formed so that an upper surface of the lift bar is arranged lower than an upper surface of the stage when the lift bar is lifted down at a lowest position.</p> |
