| 摘要 |
A method of forming a carbon nanotube structure for use in the fabrication of a field emission device using the same is provided to obtain a high grade carbon nanotube at low temperature, and therefore to realize extended product life, large area, low price, and reduced operating voltage. A method of forming a carbon nanotube structure includes the steps of: forming an electrode(112) over a substrate(110); forming a buffer layer(125) over the electrode; forming a catalyst layer(130) in form of particles over the buffer layer; etching the exposed buffer layer through the catalyst layer; and growing a carbon nanotube(150) from the catalyst layer that is prepared over the etched buffer layer. The buffer layer preferably includes an element selected from the group consisting of Al, B, Ga, In, Tl, Ti, Mo and Cr, and the catalyst layer includes an element selected from the group consisting of Fe, Co, and Ni. Further, a thickness of the buffer layer is 10 - 3000Å.
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