发明名称 APPARATUS FOR PROVIDING GAS AND APPARATUS FOR FORMING A LAYER HAVING THE SAME
摘要 An apparatus for providing gas and an apparatus for forming a layer having the same are provided to improve the injection efficiency of a process gas by forming two gas injection holes in one gas nozzle. A gas ring(110) has a shape of ring. The gas ring includes a first gas line(112) for supplying a first gas and a second gas line(114) for supplying a second gas. A plurality of gas nozzles(120) are connected to the gas ring. Each of the gas nozzles includes a first gas injection hole(122) and a second gas injection hole(124). The first gas injection hole is connected to the first gas line in order to inject the first gas. The second gas injection hole is connected to the second gas line in order to inject the second gas. The gas nozzles are arranged toward a center of the gas ring in the inside of the gas ring.
申请公布号 KR100791995(B1) 申请公布日期 2008.01.04
申请号 KR20060133793 申请日期 2006.12.26
申请人 SEMES CO., LTD. 发明人 KANG, DAE JIN;CHANG, LOUNG SUE
分类号 H01L21/205 主分类号 H01L21/205
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