发明名称 METHOD FOR FORMING MICRO LENSES AND SEMICONDUCTOR DEVICE INCLUDING THE MICRO LENSES
摘要 A method for forming a micro lens is provided to form a micro lens with a large surface area by embodying a control of a lens shape. A lens material layer(31) made of an inorganic material is formed on a substrate. An intermediate layer(32) made of an organic material is formed on the lens material layer. A mask layer(33) made of an organic material is formed on the intermediate layer. A lens shape is formed in the mask layer. An etch process is performed on the mask layer and the intermediate layer to transcribe the lens shape of the mask layer to the intermediate layer. An etch process is performed on the intermediate layer and the lens material layer by using process gas including SF6 gas and CHF3 gas so that the lens shape of the intermediate layer is transcribed to the lens material layer and a lens is formed. The lens material layer can be made of one selected from a silicon nitride layer, a silicon oxide layer and a silicon oxynitride layer. The mask layer can be made of a resist layer.
申请公布号 KR20080002638(A) 申请公布日期 2008.01.04
申请号 KR20070063369 申请日期 2007.06.27
申请人 TOKYO ELECTRON LIMITED 发明人 AMEMIYA HIROKI
分类号 H01L27/146 主分类号 H01L27/146
代理机构 代理人
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