发明名称 |
MEMORY DEVICES INCLUDING SPACER-SHAPED ELECTRODES ON PEDESTALS AND METHODS OF MANUFACTURING THE SAME |
摘要 |
A NOR flash memory device includes a substrate having trenches that extend in a first direction and stepped portions that are arranged between the trenches. A bit region having a linear shape extends in a second direction substantially perpendicular to the first direction in the substrate. The bit region is doped with impurities. A first dielectric layer is on the substrate having the trenches. An electric charge trap layer is on the first dielectric layer. A second dielectric layer is on the electric charge trap layer. An upper electrode is on sidewalls of the trenches. The upper electrode has a spacer shape. Related fabrication methods are also described.
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申请公布号 |
US2008001211(A1) |
申请公布日期 |
2008.01.03 |
申请号 |
US20070759044 |
申请日期 |
2007.06.06 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHO BYUNG-KYU;KIM TAE-YONG;LEE CHOONG-HO |
分类号 |
H01L21/336;H01L29/76 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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