发明名称 MEMORY DEVICES INCLUDING SPACER-SHAPED ELECTRODES ON PEDESTALS AND METHODS OF MANUFACTURING THE SAME
摘要 A NOR flash memory device includes a substrate having trenches that extend in a first direction and stepped portions that are arranged between the trenches. A bit region having a linear shape extends in a second direction substantially perpendicular to the first direction in the substrate. The bit region is doped with impurities. A first dielectric layer is on the substrate having the trenches. An electric charge trap layer is on the first dielectric layer. A second dielectric layer is on the electric charge trap layer. An upper electrode is on sidewalls of the trenches. The upper electrode has a spacer shape. Related fabrication methods are also described.
申请公布号 US2008001211(A1) 申请公布日期 2008.01.03
申请号 US20070759044 申请日期 2007.06.06
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO BYUNG-KYU;KIM TAE-YONG;LEE CHOONG-HO
分类号 H01L21/336;H01L29/76 主分类号 H01L21/336
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