REGISTRATION CORRECTED PHOTOMASK AND METHOD FOR CORRECTING PHOTOMASK REGISTRATION

摘要

A photomask with corrected registration is provided to reduce the fabricating cost of a photomask and a semiconductor device and shorten an interval of fabrication time by reprocessing and using a completed photomask according to a registration error. An optical pattern is formed on one surface of a photomask substrate. Laser is irradiated to the inside of the photomask substrate to form a plurality of stress generating parts(220) capable of corresponding to a registration error of the optical pattern. The optical pattern can physically be transferred by the stress generating parts to correct the registration error of the optical pattern.