| 摘要 |
A method for configuring J electromagnetic radiation sources (J>=2) to simultaneously irradiate a substrate. Each source has a different function of wavelength and angular distribution of emitted radiation. The substrate includes a base layer and I stacks (I>=2) thereon. P<SUB>j </SUB>denotes a same source-specific normally incident energy flux on each stack from source j. For simultaneous exposure of the I stacks to radiation from the J sources, P<SUB>j </SUB>is computed such that an error E being a function of |W<SUB>1</SUB>-S<SUB>1</SUB>|, |W<SUB>2</SUB>-S<SUB>2 </SUB>, . . . , |W<SUB>1</SUB>-S<SUB>1</SUB>| is about minimized with respect to P<SUB>j</SUB>=1, . . . , J). W<SUB>i </SUB>and S<SUB>i </SUB>respectively denote an actual and target energy flux transmitted into the substrate via stack i (i=1, . . . , I). The stacks are exposed to the radiation from the sources characterized by the computed P<SUB>j</SUB>=1, . . . , J).
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