发明名称 Optical inspection method and optical inspection apparatus
摘要 In the conventional contaminant particle/defect inspection method, if the illuminance of the illumination beam is held at not more than a predetermined upper limit value not to give thermal damage to the sample, the detection sensitivity and the inspection speed being in the tradeoff relation with each other, it is very difficult to improve one of the detection sensitivity and the inspection speed without sacrificing the other or improve both at the same time. The invention provides an improved optical inspection method and an improved optical inspection apparatus, in which a pulse laser is used as a light source, and a laser beam flux is split into a plurality of laser beam fluxes which are given different time delay to form a plurality of illumination spots. The scattered light signal from each illumination spot is isolated and detected by using a light emission start timing signal for each illumination spot.
申请公布号 US2008002194(A1) 申请公布日期 2008.01.03
申请号 US20070819712 申请日期 2007.06.28
申请人 MATSUI SHIGERU 发明人 MATSUI SHIGERU
分类号 G01N21/88;G01N21/956;G03F1/84;H01L21/027;H01L21/66 主分类号 G01N21/88
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