发明名称 Device for Ethcing a Conductive Layer and Etching Method
摘要 Device for chemically etching a layer ( 2 ) having electrical conduction properties on a transparent substrate ( 1 ), which device comprises support means ( 4 ) for supporting the substrate ( 1 ) and spray means ( 5 ) for spraying a solution, characterized in that the spray means ( 5 ) consists of a multiplicity of nozzles ( 50 ) that are placed above the substrate and are intended to simultaneously spray onto the layer to be etched at least two solutions ( 7, 8 ) either independently of each other or as a mixture mixed at the nozzles.
申请公布号 US2008000873(A1) 申请公布日期 2008.01.03
申请号 US20050577357 申请日期 2005.09.30
申请人 SAINT-GOBAIN GLASS FRANCE 发明人 MAZZARA CHRISTOPHE;GIRARD JAONA
分类号 C25F3/14 主分类号 C25F3/14
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