| 摘要 |
A method of manufacturing a pattern can control the shape of a resist mask that forms read terminals in a predetermined pattern with high precision, so that the formation precision of the read terminals is improved and the manufacturing yield of the magnetic head is improved. The method includes: a step of forming a layer to be patterned on a substrate; a step of forming a first mask layer on the layer to be patterned; a step of forming a second mask layer, which has a lower etching rate during a dry etching process than the first mask layer, on the first mask layer; a step of exposing and developing the second-mask layer to form the second mask layer in a predetermined shape; and a step of removing exposed parts of the first mask layer that are exposed from the second mask layer by dry etching and dry etching a part of the first mask layer below the second mask layer from sides thereof to form a column part in the first mask layer that is narrower than the second mask, thereby forming a mask with overhanging parts.
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