发明名称 Semiconductor device with a field stop zone
摘要 A semiconductor device includes a semiconductor material, the semiconductor material including a base region and a field stop zone including a first side adjacent the base region and a second side opposite the first side. The field stop zone includes a first dopant implant and a second dopant implant. The first dopant implant has a first dopant concentration maximum and the second dopant implant has a second dopant concentration maximum with the first dopant concentration maximum being less than the second dopant concentration maximum, and being located closer to the second side than the second dopant concentration maximum.
申请公布号 US2008001257(A1) 申请公布日期 2008.01.03
申请号 US20060480150 申请日期 2006.06.30
申请人 INFINEON TECHNOLOGIES AUSTRIA AG 发明人 SCHULZE HANS-JOACHIM;NIEDERNOSTHEIDE FRANZ-JOSEF;STRACK HELMUT;SCHAEFFER CARSTEN;PFIRSCH FRANK
分类号 H01L27/082 主分类号 H01L27/082
代理机构 代理人
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