| 摘要 |
<p>A reticle align stage is provided to decrease an error in aligning a reticle by reducing friction resistance of a reticle align stage and a reticle supported by the reticle align stage. A reticle is loaded and placed on a vacuum absorption unit(110) for vacuum-absorbing the reticle. An elevation member(120) reduces friction resistance with the reticle, installed under the reticle placed on the vacuum absorption unit and capable of moving up and down. An elevation driving unit(130) moves up/down the elevation member. A control part controls the elevation driving unit to separate the reticle from the vacuum absorption unit, making the elevation member support the reticle in aligning the reticle. The elevation member is made of a material having a low friction coefficient to reduce the friction resistance with the reticle. The elevation driving unit can be a cylinder capable of contracting and expanding vertically.</p> |
