| 摘要 |
<p>A pellicle structure of a photo mask and a method for manufacturing the same are provided to maintain a transmittance of light and to prevent contamination of the photo mask due to particles by forming a concavo-convex structure. A membrane layer(108) has a concavo-convex structure and receives and transmits the light. A first anti-oxidation layer(106) is formed on a lower part of the membrane layer. A second anti-oxidation layer is formed on an upper part of the membrane layer. The membrane layer is made of silicon. The membrane layer has a thickness of 25nm to 50nm. The concavo-convex structure is formed with a 1:1 line and space type. The first anti-oxidation layer and the second anti-oxidation layer are made of ruthenium. The first anti-oxidation layer and the second anti-oxidation layer have the thickness of 5nm.</p> |
