发明名称 Application of Different Isolation Schemes for Logic and Embedded Memory
摘要 The present invention facilitates semiconductor device fabrication by providing mechanisms for utilizing different isolation schemes within embedded memory and other logic portions of a device. The isolation mechanism of the embedded memory portion is improved relative to other portions of the device by increasing dopant concentrations or reducing the depth of the dopant profiles within well regions of the embedded memory array. As a result, smaller isolation spacing can be employed thereby permitting a more compact array. The isolation mechanism of the logic portion is relatively less than that of the embedded memory portion, which permits greater operational speed for the logic.
申请公布号 US2008003772(A1) 申请公布日期 2008.01.03
申请号 US20070848187 申请日期 2007.08.30
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 SADRA KAYVAN;TSAO ALWIN;SRIDHAR SEETHARAMAN;CHATTERJEE AMITAVA
分类号 H01L21/76;H01L21/762;H01L21/8234;H01L21/8238;H01L21/8239;H01L27/02;H01L27/105 主分类号 H01L21/76
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