| 摘要 |
An apparatus and a method for inspecting a mask using a SEM are provided to acquire the critical dimension of patterns precisely by executing compensation based on the thickness of a conductive layer. An apparatus for inspecting a mask using a SEM(Scanning Electron Microscope) includes the SEM(100), a loader(200), a coating unit(301), and a striping unit(303). The SEM measures image or CD(Critical Dimension) on surface patterns of a photo mask. The loader loads or unloads the photo mask to/from the SEM. The coating unit installed between the loader and SEM coats conductive material on a surface of the loaded photo mask. The striping unit, which is installed with the coating unit, strips the conductive material from the surface of the loaded photo mask.
|
