发明名称 Non-volatile memory device and method for fabricating the same
摘要 A non-volatile memory device and a method for fabricating the non-volatile memory device. The non-volatile memory device includes a memory cell located in a first conductive region and has a memory transistor, a selection transistor and a high voltage switching device located in a second conductive region close to the first conductive region. The memory cell is controlled by the high voltage switching device. At least one of the high voltage switching device, the memory transistor, or the selection transistor has a recessed channel region.
申请公布号 US2008001204(A1) 申请公布日期 2008.01.03
申请号 US20060647711 申请日期 2006.12.29
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE YONG-KYU;JEON HEE-SEOG;HAN JEONG-UK
分类号 H01L29/76 主分类号 H01L29/76
代理机构 代理人
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