发明名称 |
SCAN PATTERN FOR AN ION IMPLANTER |
摘要 |
An ion implanter includes an ion beam generator configured to generate an ion beam and direct the ion beam towards a workpiece, wherein relative motion between the ion beam and the workpiece produces a scan pattern on a front surface of said workpiece. The scan pattern has an oscillating pattern on at least a portion of said front surface of said workpiece. |
申请公布号 |
WO2008002403(A2) |
申请公布日期 |
2008.01.03 |
申请号 |
WO2007US14008 |
申请日期 |
2007.06.14 |
申请人 |
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.;DZENGELESKI, JOSEPH, P. |
发明人 |
DZENGELESKI, JOSEPH, P. |
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