发明名称 PVD CYLINDRICAL TARGET
摘要 The present invention provides a PVD cylindrical target comprising an evaporation material covering the outer circumferential surface of a cylindrical substrate, the PVD cylindrical target includes a meshing part having at least either of a protruding shape and a recessed shape formed with rounded angular parts at the interface between the substrate and the evaporation material. According to such a structure, peeling or cracking of the evaporation material by a residual stress caused at the interface between the substrate and the evaporation material by a thermal expansion difference between the both can be suppressed, and sufficient adhesiveness between the both can also be ensured.
申请公布号 US2008003385(A1) 申请公布日期 2008.01.03
申请号 US20070755318 申请日期 2007.05.30
申请人 KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL LTD.) 发明人 TAKAO TOSHIAKI;OKAZAKI TAKAHIRO;FUJII HIROFUMI
分类号 B29D23/00;C23C14/34 主分类号 B29D23/00
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