发明名称 |
NARROW HOOK OF ORIENTAL CHAMBER |
摘要 |
<p>A narrow hook of an alignment chamber is provided to reduce or minimize helium leak errors by improving a change of a position of a wafer. A narrow hook(100) is coupled with an inside of an alignment chamber for aligning a wafer(W) to support the wafer from a lower part of the wafer. A sliding prevention part(110) is arranged at a wafer attaching part of the narrow hook not to change a position of the wafer in a lifting process of the narrow hook. A first and second supporting parts(101,102) have the same shapes and are arranged opposite to each other. A horizontal part(103) is extended from the first and second supporting parts. The wafer is loaded on an upper surface of the horizontal part. A slope part is formed to connect the first and second supporting parts with the horizontal part. An inner part of the slope is bent along a shape of the wafer.</p> |
申请公布号 |
KR20080001119(A) |
申请公布日期 |
2008.01.03 |
申请号 |
KR20060059246 |
申请日期 |
2006.06.29 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
BAE, SUNG JIN |
分类号 |
H01L21/02;H01L21/677;H01L21/68 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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