发明名称 Semiconductor device
摘要 A semiconductor device includes a semiconductor substrate of a first conductivity type having a top surface and a bottom surface, a semiconductor layer of a first conductivity type formed on the top surface of the semiconductor substrate, and having an active region and an edge termination region surrounding the active region, a first semiconductor region of a second conductivity type formed in the edge termination region adjacent to an edge of the active region, a second semiconductor region of a second conductivity type buried in the edge termination region in a sheet shape or a mesh shape substantially in parallel with a surface of the semiconductor layer, a first electrode formed on the active region of the semiconductor layer and a part of the first semiconductor region, and a second electrode formed on the bottom surface of the semiconductor substrate.
申请公布号 US2008001159(A1) 申请公布日期 2008.01.03
申请号 US20070821740 申请日期 2007.06.25
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 OTA CHIHARU;NISHIO JOHJI;HATAKEYAMA TETSUO;SHINOHE TAKASHI
分类号 H01L29/04 主分类号 H01L29/04
代理机构 代理人
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