| 摘要 |
A hard film formed of a material containing a (M<SUB>1-x</SUB>Si<SUB>x</SUB>)(C<SUB>1-d</SUB>N<SUB>d</SUB>) compound, wherein M is at least one of Al and the elements in groups 3A, 4A, 5A and 6A, 0.45<=x<=0.98 and 0<=d<=1, wherein x, 1-x, d and 1-d are atomic ratios of Si, M, N and C, respectively.
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