| 摘要 |
<p>When a predetermined processing, e.g. a film deposition processing, is performed on a workpiece (W) under the existence of plasma by supplying inert gas and processing gas into a processing container, a step for setting a pressure in the processing container to a pressure capable of igniting plasma by starting inert gas supply into the processing container, a step for starting processing gas supply into the processing container and igniting plasma before it becomes non-ignitable due to an increase in partial pressure of the processing gas, a step for regulating the pressure in the processing container to a process pressure for carrying out the predetermined processing, and a step for carrying out the predetermined processing by altering plasma power supplied in order to ignite and sustain plasma to the value of plasma power for carrying out the predetermined processing, are performed sequentially. Since the predetermined processing is performed effectively on the workpiece immediately after start of the step for carrying out the predetermined processing, throughput can be enhanced sharply.</p> |
