发明名称 ORGANIC THIN FILM TRANSISTOR SUBSTRATE AND FABRICATING METHOD THEREOF
摘要 An organic thin film transistor substrate and a method for manufacturing the same are provided to protect not only a thin film transistor but also a peripheral region of the TFT by an organic passivation layer formed within a line hole of a bank insulating layer along the gate line, thereby preventing the damage of the organic semiconductor layer and increasing a process margin of an ink-jet device. A gate line and a data line(104) cross each other to define a sub-pixel region. An organic thin film transistor(130) includes a gate electrode(106) connected to the gate line, a source electrode(108) connected to the data line, a drain electrode(110) facing the source electrode, and an organic semiconductor layer(114) for forming a channel between the source electrode and the drain electrode. A passivation layer(120) is formed in parallel with the gate line to cover the organic semiconductor layer and a peripheral region of the organic semiconductor layer. A bank insulating layer(118) has a stepped portion such that the organic semiconductor layer and the passivation layer fill the bank insulating layer.
申请公布号 KR20080000861(A) 申请公布日期 2008.01.03
申请号 KR20060058697 申请日期 2006.06.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO, SEUNG HWAN;KIM, BO SUNG;SONG, KEUN KYU
分类号 G02F1/136;G02F1/361 主分类号 G02F1/136
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