发明名称 CHAMBER APPARATUS
摘要 A chamber apparatus is provided to increase productivity and to reduce a manufacturing cost by preventing a process error due to foreign materials or particles in a metal contact process. A chamber apparatus includes a first housing part(110), a second housing part(130), and a sealing member(200). The first housing part and the second housing part are formed to set an internal space(105) for performing a predetermined process. The sealing member is formed on opposite surfaces of the first housing part and the second housing part in order to form a vacuum sealing state. A gap between the opposite surfaces of the first housing part and the second housing part is increased from an introduction part of the sealing member toward the internal space.
申请公布号 KR20080001442(A) 申请公布日期 2008.01.03
申请号 KR20060059898 申请日期 2006.06.29
申请人 HYNIX SEMICONDUCTOR INC. 发明人 KIM, SUN KAK
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
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