| 摘要 |
<p>A track developer apparatus is provided to improve the reliability of manufacturing a semiconductor device by effectively cleaning a surface of the semiconductor device by using a DIW rinse nozzle, a nozzle transfer arm, and an air cylinder, which are driven independently from one another. A track developer apparatus includes DIW(De-Ionized Water) rinse nozzles(120,125), nozzle transfer arms(130,135), support slits(140,145), chain rails(150,155), motor portions(160,165), a connecting mount(170), and an air cylinder(180). The nozzle transfer arms support the DI rinse nozzles. The support slits support the nozzle transfer arms. The chain rails penetrate a center portion of the support mount slit and provide a transfer path for the nozzle transfer arm. The motor portions move the chain rails in a horizontal direction. The connecting mount arranges more than two motor portions and support mount slits in the horizontal direction. The air cylinder moves the connecting mount in a vertical direction.</p> |
