METHOD FOR VERIFYING OPTICAL-TRANSMITTANCE OF METAL FILM

摘要

A method for verifying an optical-transmittance of a metal film is provided to suppress transmission of visible rays by using a nano-spectrum measurement device. A silicon oxide layer having a predetermined thickness is formed on a semiconductor substrate. A metallic thin film as an optical-transmittance target is sequentially deposited on the silicon oxide layer by using a CVD(Chemical Vapor Deposition) method or a PVD(Physical Vapor Deposition) method. A reflectance is continuously measured according to each thickness of the metallic thin films. The reflectance of each wavelength is converted to an optical-transmittance by multiplying the reflectance by a photonic constant. A luminous intensity graph is converted according to a thickness thereof by numerating an internal area thereof. A point having a minus value is detected as a minimum thickness for suppressing the optical-transmittance by differentiating the luminous intensity graph.