发明名称 Semiconductor device
摘要 A semiconductor device includes a semiconductor substrate (1) of a first conductivity type, a semiconductor layer (2) of the first conductivity type formed on the semiconductor substrate (1) and having an active region and an edge termination region surrounding the active region, a first semiconductor region (8) of a second conductivity type formed in the edge termination region adjacent to an edge of the active region, a second semiconductor region (7) of a second conductivity type buried in the edge termination region in a sheet or mesh shape substantially in parallel with a surface of the semiconductor layer (2), a first electrode (3) formed on the active region of the semiconductor layer (2) and a part of the first semiconductor region (8), and a second electrode (4) formed on the bottom surface of the semiconductor substrate (1).
申请公布号 EP1873839(A2) 申请公布日期 2008.01.02
申请号 EP20070012590 申请日期 2007.06.27
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 OTA, CHIHARU;NISHIO, JOHJI;HATAKEYAMA, TETSUO;SHINOHE, TAKASHI
分类号 H01L29/872;H01L21/04;H01L21/329;H01L21/331;H01L21/336;H01L29/06;H01L29/24;H01L29/739;H01L29/78;H01L29/861 主分类号 H01L29/872
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