| 摘要 |
A polishing member and a method of manufacturing the same are provided to progress a polishing process clean and to prevent environmental pollution by utilizing a hard layer instead of slurry during chemical mechanical polishing. A polishing member(900) comprises a support layer(500), a plurality of substrate pieces(100'), a hard layer pattern(300a), and a protection layer pattern(400a). The support layer has upper and lower surfaces. The substrate pieces are attached to the upper surface of the support layer. The hard layer pattern extends from a polishing surface of the substrate piece to the inside of the substrate piece and shapes into a roof. The protection layer pattern is formed in the hard layer pattern and supports the lateral wall of the hard layer pattern. The substrate piece is made of silicon.
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