发明名称 PHOTO RESIST PRECIPITATION PREVENTION SYSTEM AND METHOD THEREOF
摘要 <p>A photoresist precipitation prevention system and a precipitation prevention method of the same are provided to disperse photoresist residues by supplying air and a thinner into an inside of a drain box. A regulator(1) adjusts an air supplying and displays differential pressure of gases. A chemical I/O board(2) adjusts a photoresist distribution driving solenoid valve. An air valve(4) is formed to control the air supplying. An air solenoid valve(3) controls the air valve according to according to chemical I/O signals. A thinner tank(7) is used for storing a thinner. An N2 valve(6) controls a supplying of N2 gases. A thinner solenoid valve(5) is formed to control the N2 valve. A filter(8) is formed to remove bubbles through the flow of the thinner and to filter the thinner. A thinner valve(9) is formed to control the flow of the thinner tank into a machine. A check valve(10) is formed. A first drain box is formed to receive the photoresist.</p>
申请公布号 KR100790300(B1) 申请公布日期 2008.01.02
申请号 KR20060072625 申请日期 2006.08.01
申请人 DONGBU ELECTRONICS CO., LTD. 发明人 KIM, SUNG HO
分类号 H01L21/02;H01L21/027 主分类号 H01L21/02
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