| 摘要 |
<p>A lithography apparatus of a semiconductor device is provided to prevent contamination of a stage and a chuck by installing a movable nozzle of a circular tube type in an inside of a catch cup. A coating unit of track equipment includes a catch cup(105) having a double structure, a wafer supporting plate(140), a nozzle(120) of a circular tube type disposed around the wafer supporting plate, and a hole(130) formed at a lower part of the catch cup. The nozzle is formed with a spray structure. The nozzle is moved upwardly and downwardly on the basis of the wafer supporting plate as a center axis. The hole is used for discharging the remaining contaminants from the catch cup. The wafer supporting plate is installed in the inside of the catch cup to support a wafer.</p> |
