| 摘要 |
A reactor for an atomic layer deposition (ALD) method, the reactor comprising a vacuum chamber (1) which has a first end wall (2) provided with a loading hatch, a second end wall (3) provided with a rear flange, side walls/casing (4) connecting the first and the second end walls (2, 3), and at least one source material fitting (5) for feeding source materials into the vacuum chamber of the reactor (1). According to the invention, at least one of the source material fittings (5) is provided in the side wall/casing (4) of the vacuum chamber (1) of the reactor.
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