METHOD FOR MEASURING OVERLAY AND MANAGEMENT SYSTEM OF SEMICONDUCTOR MANUFACTURING EQUIPMENT AT THE SAME

摘要

A method for measuring an overlay and a management system of semiconductor manufacturing equipment are provided to prevent an overlay measuring error by outputting an interlock control signal. A host computer inputs a reference recipe into an equipment computer(S100). A map is set according to the reference recipe in order to receive an overlay mark position formed on the reticle and to store the set information(S200). An overlay measuring process is performed along the map by using an optical device controlled by an equipment computer(S300). A center of a wafer is measured and recognized(S400). A shot reference point is measured and recognized(S500). A position of an overlay mark is inputted and measured information is obtained(S600). The measured information is compared with the set information(S700). An interlock control signal is outputted according to the compared result(S1000).