发明名称 |
POLYVINYLAMMONIUM COMPOUND, METHOD OF MANUFACTURING SAME, ACIDIC SOLUTION CONTAINING SAID COMPOUND AND METHOD OF ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT |
摘要 |
The invention relates to a polyvinylammonium compound, to a method of manufacturing said compound, to an aqueous acidic solution containing at least said polyvinylammonium compound for electrolytically depositing a copper deposit as well as to a method of electrolytically depositing a copper deposit using said aqueous acidic solution, said polyvinylammonium compound corresponding to the general chemical formula (I): as well as to polyvinylammonium compounds of the general chemical formula (I), wherein one of the monomer units or both having indices I and m are present in the neutral form. |
申请公布号 |
KR20080000563(A) |
申请公布日期 |
2008.01.02 |
申请号 |
KR20077020833 |
申请日期 |
2006.03.01 |
申请人 |
ATOTECH DEUTSCHLAND GMBH |
发明人 |
DAHMS WOLFGANG;GRIESER UDO;HARTMANN PHILIP |
分类号 |
C08F222/02;C08F8/44;C25D3/38 |
主分类号 |
C08F222/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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