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发明名称
琉璃窑烧方法
摘要
本发明为一种琉璃窑烧方法,系指将具有瑕庛之琉璃工件,经清洗及确实乾燥后,由烤炉平台加热高温二次窑烧后,因高温加热状态下,琉璃呈现膏状,使其工件内有如气泡......等之瑕庛释出并完全整平消除为无气泡产生,再将烤炉关闭,待其约4-5个小时之缓慢降温至100℃后,打关炉盖,使温度降至常温,再挑选已完成之琉璃粗胚工件,藉以粗、细研磿砂,将琉璃与烤炉接触之面磨平、磨细后,透过软布及抛光机抛光,使琉璃工件表面呈现光泽,即呈现出另一种不同风貌之琉璃成品。
申请公布号
TW200800818
申请公布日期
2008.01.01
申请号
TW095120881
申请日期
2006.06.13
申请人
施秀菊
发明人
施秀菊
分类号
C03B32/00(2006.01)
主分类号
C03B32/00(2006.01)
代理机构
代理人
黄志扬
主权项
地址
屏东县三地门三地村中正路2段61号
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