发明名称 Irradiation system with ion beam/charged particle beam
摘要 In an irradiation system with an ion beam/charged particle beam having an energy filter, the energy filter is formed by deflection electrodes and a deflection magnet which can be switchingly used. The deflection magnet has a general window-frame shape and is formed with a hollow portion at its center. The deflection electrodes are installed, along with suppression electrodes, in a vacuum chamber arranged in the hollow portion of the deflection magnet. The deflection electrodes are installed with respect to the deflection magnet such that a deflection trajectory of a beam caused by a magnetic field and a deflection trajectory of a beam caused by an electric field overlap each other. Since the deflection electrodes and the deflection magnet can be switchingly used, the system can deal with a wider range of beam conditions and thus is widely usable.
申请公布号 US7315034(B2) 申请公布日期 2008.01.01
申请号 US20050202101 申请日期 2005.08.12
申请人 SEN CORPORATION, AN SHI AND AXCELIS COMPANY 发明人 YAGITA TAKANORI;NISHI TAKASHI;SUGITANI MICHIRO;MURAKAMI JUNICHI;TSUKIHARA MITSUKUNI;KABASAWA MITSUAKI;ISHIKAWA MASAKI;KUDO TETSUYA
分类号 H01J37/147 主分类号 H01J37/147
代理机构 代理人
主权项
地址