发明名称 |
Irradiation system with ion beam/charged particle beam |
摘要 |
In an irradiation system with an ion beam/charged particle beam having an energy filter, the energy filter is formed by deflection electrodes and a deflection magnet which can be switchingly used. The deflection magnet has a general window-frame shape and is formed with a hollow portion at its center. The deflection electrodes are installed, along with suppression electrodes, in a vacuum chamber arranged in the hollow portion of the deflection magnet. The deflection electrodes are installed with respect to the deflection magnet such that a deflection trajectory of a beam caused by a magnetic field and a deflection trajectory of a beam caused by an electric field overlap each other. Since the deflection electrodes and the deflection magnet can be switchingly used, the system can deal with a wider range of beam conditions and thus is widely usable.
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申请公布号 |
US7315034(B2) |
申请公布日期 |
2008.01.01 |
申请号 |
US20050202101 |
申请日期 |
2005.08.12 |
申请人 |
SEN CORPORATION, AN SHI AND AXCELIS COMPANY |
发明人 |
YAGITA TAKANORI;NISHI TAKASHI;SUGITANI MICHIRO;MURAKAMI JUNICHI;TSUKIHARA MITSUKUNI;KABASAWA MITSUAKI;ISHIKAWA MASAKI;KUDO TETSUYA |
分类号 |
H01J37/147 |
主分类号 |
H01J37/147 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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