EXPOSURE METHOD, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

An immersion apparatus (132) is provided with a mixing mechanism for mixing a prescribed substance with a liquid supplied on a liquid-repellent film on the surface of an object (member) arranged on a light outgoing side of a projection optical system (PL) and dissolving the substance. The prescribed substance adjusts the specific resistivity of the liquid. A liquid (Lq) wherein the prescribed substance is dissolved is supplied on the liquid-repellent film and an immersion region is formed.