| 摘要 |
<p>A slit coater is provided to reduce a defect formed in a substrate when photoresist is deposited, by separately forming a cleaning part and a dry part so that the particles or impurities not cleaned are prevented from being left in a slot nozzle. A support member supports a substrate. A slit coater coats photoresist on the substrate, including a slit nozzle having an outlet through which photoresist flows. A cleaning unit cleans the slit nozzle. The cleaning unit includes a guide part(212), a cleaning part and a dry part(220). The slit nozzle is placed on the guide part. Cleaning parts(221) are installed at both sides of the guide part, including at least one injection part for injecting a cleaning solution. Dry parts are installed at both sides of the guide part, including at least one injection part for injecting air. The cleaning part can be separated from the dry part. A cleaning member comes in contact with the slit nozzle to remove foreign substances attached to the slit nozzle.</p> |
