| 摘要 |
A ATMOSPHERIC WAFER PROCESSING SYSTEM FOR DELIVERING AT LEAST ONE GAS IS PROVIDED, HAVING AN EXHAUST CONTROL FEEDBACK SYSTEM THAT UTILIZES SENSORS TO MEASURE THE PRESSURE WITHIN THE SYSTEM AND ADJUSTS CONTROL UNITS TO MAINTAIN THE DESIRED SET PRESSURES WITHIN THE SYSTEM. IN PARTICULAR THE SENSORS MEASURE THE SMALL DIFFERENTIAL PRESSURES INSIDE A MUFFLE, AND SPECIFICALLY THE LOAD, BYPASS CENTER AND UNLOAD SECTIONS OF THE MUFFLE, RELATIVE TO THE CHASE AMBIENT PRESSURE. CONTROLLING THE MUFFLE PRESSURE DIRECTLY WITHIN THE ATMOSPHERIC SYSTEM YIELDS A MORE STABLE PRESSURE BALANCE FOR PROCESSING WAFERS LESS SUBJECT TO CHANGES IN THE EXTERNAL ENVIRONMENT AND ALLOWS FOR COMPENSATION OF VARYING INPUT GAS FLOWS AS OCCURS WHEN THE SUPPLY PRESSURE TO THE SYSTEM MAY VARY.
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