| 摘要 |
A substrate processing apparatus is provided to improve processing efficiency by preventing formation of dewdrops of solvent steam which produces origins of particles in the closed processing container and unevenness in cleaning. A processing container(10) accommodates a substrate therein, and a processing-gas supplying unit supplies a processing gas into the processing container. A solvent-vapor generator(33) generates a solvent vapor to be supplied into the processing container. A solvent-vapor nozzle(30) is arranged in the processing container and is connected to the solvent-vapor generator. The solvent-vapor nozzle has a nozzle body having plural nozzle orifices formed at appropriate intervals and a condensation-proof mechanism for preventing dewdrops from being formed in an inside space of the nozzle body.
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