发明名称 ANTISTATIC COMPOSITION, ANTISTATIC LAYER AND ANTISTATIC FILM
摘要 PROBLEM TO BE SOLVED: To provide an antistatic composition having good compatibility of a quaternary ammonium salt group-containing polymer. SOLUTION: The antistatic composition comprises a compound having an acryloyl or a methacryloyl group, the quaternary ammonium salt group-containing polymer and a polymerizable monomer having an amide group. The compatibility of the quaternary ammonium salt group-containing polymer and the adhesiveness, etc., to a substrate are improved by adding the polymerizable monomer having the amide group to a composition. An antistatic layer and an antistatic film having excellent antistatic properties, scuff resistance, transparency and even adhesiveness to the substrate even under environments of exposure to ultraviolet light or high temperature/high humidity loads are provided by the antistatic composition having the good compatibility of the quaternary ammonium salt group-containing polymer. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007332181(A) 申请公布日期 2007.12.27
申请号 JP20060162428 申请日期 2006.06.12
申请人 NIPPON KASEI CHEM CO LTD 发明人 SAITO TAKESHI;IGARI TAKANORI;AKIYAMA HITOSHI
分类号 C09K3/16;C08F2/44;C08F290/06;C08F291/12;C09D4/00;C09D5/00;C09D5/24;C09D133/14 主分类号 C09K3/16
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