发明名称 METHOD AND APPARATUS FOR PRODUCING THIN FILM-LIKE COMPONENT HAVING FINE PATTERN, AND METHOD FOR PRODUCING LIQUID CRYSTAL DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method and apparatus for producing a thin film-like component having a fine pattern, by which the product reliability and the productivity can be improved by enhancing the uniformity within a wafer surface of the film thickness of a component-forming material applied on the fine pattern of a replica which has the fine pattern and is formed of a specific material soluble in a specific solvent exhibiting no solubility to glass; and to provide a method for producing a liquid crystal device. <P>SOLUTION: The method for producing the thin film-like component includes: an injection process for injecting a heatless glass material into a component-forming space 28 between the replica 20 having a fine pattern and formed of a specific material soluble in a specific solvent exhibiting no solubility to the heatless glass material and a supporting substrate 21 arranged oppositely in parallel to the replica 20 at a prescribed distance; a rotation process for rotating the replica 20 and the supporting substrate 21; a curing process for curing the heatless glass material; and a dissolving process for dissolving the replica 20 by the specific solvent. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2007331954(A) 申请公布日期 2007.12.27
申请号 JP20060162198 申请日期 2006.06.12
申请人 SEIKO EPSON CORP 发明人 KENMOCHI NOBUHIKO
分类号 C03B19/12;C03B8/02;G02B5/18;G02F1/1337 主分类号 C03B19/12
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