Illumination device for microlithographic projection exposure apparatus, has compensator plate, where portion of double refraction is partially compensated by plate, and portion is rotationally symmetrical about optical axis

摘要

The device has a compensator plate (140), where a linearly polarized input bundle impinges on the compensator plate, and the linearly polarized input bundle has an angular spectrum. A maximum aperture angle of the input bundle amounts to not more than 35 mill radians. A portion of double refraction that is provided in the illumination device is partially compensated for by the compensator plate, where the portion is rotationally symmetrical about an optical axis (SA). Independent claims are also included for the following: (1) a method for influencing polarization distribution in the illumination device of the microlithographic projection apparatus (2) a method for microlithographic production of micro structured components (3) a microstructured component which is produced according to the method for microlithographic production of micro structured components.