发明名称 METHOD OF FORMING DIELECTRIC FILM, PIEZOELECTRIC ELEMENT, AND LIQUID JETTING HEAD
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of forming a dielectric film which can be homogeneously crystallized, a method of manufacturing a piezoelectric element, and a method of manufacturing a liquid jetting head. <P>SOLUTION: A baking process comprises a first baking step of baking after forming at least one layer of a defatted dielectric precursor film 71 by a dielectric precursor film forming step over the entire surface a substrate 110 including its peripheral portion in its one plane, and a second backing step of baking after forming the defatted dielectric precursor film 71 by the dielectric precursor film forming step on other regions than the peripheral portion of the substrate 110 in its one plane. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007335537(A) 申请公布日期 2007.12.27
申请号 JP20060164008 申请日期 2006.06.13
申请人 SEIKO EPSON CORP 发明人 KURIKI AKIRA
分类号 H01L41/09;H01L41/18;H01L41/187;H01L41/22;H01L41/318;H01L41/43 主分类号 H01L41/09
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