| 摘要 |
PROBLEM TO BE SOLVED: To improve alignment accuracy of a deposition mask and a substrate by reducing the self-weight deflection of the substrate. SOLUTION: A substrate holder 2 for retaining the substrate 3 to be deposited is oppositely arranged to two or more deposition masks 7 having pixel opening parts 7a corresponding to deposition patterns. The substrate holder 2 is provided with a frame body 2a and crosspieces 2b projected from frame side pieces forming the frame body 2a toward the inside of the frame. The crosspieces 2b are arranged in positions where deposited materials from the deposition masks 7 are not passed through. The inside of the frame is partitioned by the frame side pieces forming the frame body 2a and crosspieces 2b to form opening parts 2c for making the deposited materials reach the substrate 3. COPYRIGHT: (C)2008,JPO&INPIT
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