发明名称 Fabrication method and structure of an ITO anode containing nickel points for an OLED to selectively light
摘要 A fabrication method of an indium tin oxide (ITO) anode containing point nickel for an organic light emitting diode (OLED) to selectively light includes various processes of preparing an ITO substrate with an anode having plural point grooves, of forming a nickel film on the anode, and of grinding the nickel film to leave the point grooves fitted with nickel. Therefore, the nickel spots of the ITO anode are lit up earlier than the pure ITO anode when the OLED is turn on. Because the nickel spots have a lower resistance, current can aggregate in these spots collectively, reducing demerit of cross-talk happening often in a conventional passive OLED panel circuit. The structure of the OLED includes an ITO substrate with an anode provided point grooves deposited with nickel, a hole transport layer on the anode, and an electron transport layer on the hole transport layer.
申请公布号 US2007298222(A1) 申请公布日期 2007.12.27
申请号 US20060471478 申请日期 2006.06.21
申请人 CHING-MING HSU 发明人 HSU CHING-MING;WU WEN-TUAN;TSAI CHUNG-LIN
分类号 H01L51/50;B32B3/00;H01L51/56;H05B33/02;H05B33/26 主分类号 H01L51/50
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