发明名称 Transfer method for forming a silicon-on-plastic wafer
摘要 A method of fabricating a silicon-on-plastic layer via layer transfer includes depositing a layer of SiGe on a silicon substrate; depositing a layer of silicon; implanting splitting hydrogen ions into the silicon substrate; bonding a glass substrate to the silicon layer; splitting the wafer; removing the silicon layer and a portion of the SiGe layer; depositing a dielectric on the silicon side of the silicon-on-glass wafer; applying adhesive and bonding a plastic substrate to the silicon side of the silicon-on-glass wafer; removing the glass from the glass side of the bonded, silicon-on-glass wafer to form a silicon-on-plastic wafer; and completing a desired IC device on the silicon-on-plastic. Multi-level structure may be fabricated according to the method of the invention by repeating the last few steps of the method of the invention.
申请公布号 US2007298588(A1) 申请公布日期 2007.12.27
申请号 US20070891502 申请日期 2007.08.10
申请人 SHARP LABORATORIES OF AMERICA, INC. 发明人 MAA JER-SHEN;LEE JONG-JAN;TWEET DOUGLAS J.;HSU SHENG T.
分类号 H01L21/301 主分类号 H01L21/301
代理机构 代理人
主权项
地址