ELECTRICAL CONDITIONING OF MEMS DEVICE AND INSULATING LAYER THEREOF
摘要
A method of fabricating a MEMS device includes conditioning of an insulating layer by applying a voltage across the insulating layer via a conductive sacrificial layer for a period of time, prior to removal of the conductive sacrificial layer. This conditioning process may be used to saturate or stabilize charge accumulated within the insulating layer. The resistance across the insulating layer may also be measured to detect possible defects in the insulating layer.
申请公布号
WO2007100457(A3)
申请公布日期
2007.12.27
申请号
WO2007US03267
申请日期
2007.02.07
申请人
QUALCOMM INCORPORATED;CHOU, CHEN-JEAN;WU, CHUN-CHEN;BRINKLEY, PATRICK, F.
发明人
CHOU, CHEN-JEAN;WU, CHUN-CHEN;BRINKLEY, PATRICK, F.