FILM FORMING APPARATUS AND FILM FORMING METHOD

摘要

A film forming apparatus is provided with a chamber which partitions a processing space for performing film forming process to a substrate; a stage arranged in the chamber for placing the substrate; a substrate heating means arranged on the stage for heating the substrate; a shower head which is arranged to face the stage and has many gas jetting holes; a gas supplying mechanism for supplying the chamber with a processing gas through the shower head; a cooling means arranged above the shower head for cooling the shower head; and a shower head heating means arranged above the cooling means for heating the shower head through the cooling means.