| 摘要 |
A polishing composition comprises an alumina grain which contains a -alumina as the main component; fumed alumina; a polishing accelerator which contains at least one component selected from the group consisting of organic acids, inorganic acids, and salts thereof; and water. Examples of the polishing accelerator include succinic acid, citric acid, aluminium nitrate and iron nitrate. The polishing composition may further comprise alumina sol. Also shown is a method for polishing a substrate for a magnetic disk using the polishing composition. |
